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EPITAXIAL Datasheet, PDF

Searched Keyword : 'Epitaxial' - Total: 11797 (7/590) Pages
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Guangdong Kexin Industr...
2SA1954 Datasheet pdf image
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Silicon PNP Epitaxial
2SD2121S Datasheet pdf image
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Silicon NPN Epitaxial
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GTM CORPORATION
GS123 Datasheet pdf image
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NPN EPITAXIAL TRANSISTOR
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Renesas Technology Corp
HIT562 Datasheet pdf image
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Silicon PNP Epitaxial
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GTM CORPORATION
GSD2656 Datasheet pdf image
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NPN EPITAXIAL TRANSISTOR
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New Jersey Semi-Conduct...
2N6566 Datasheet pdf image
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SILICON EPITAXIAL JUNCTION
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Comset Semiconductor
2N3789 Datasheet pdf image
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EPITAXIAL-BASE TRANSISTORS
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SeCoS Halbleitertechnol...
BCP69-C Datasheet pdf image
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Silicon Epitaxial Transistor
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EIC discrete Semiconduc...
BYV27 Datasheet pdf image
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EPITAXIAL AVALANCHE DIODES
Rev. 03 : July 8, 2005
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KEC(Korea Electronics)
KTX311T Datasheet pdf image
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EPITAXIAL PLANAR PNP TRANSISTOR SILICON EPITAXIAL PLANAR TYPE DIODE
KTX412T Datasheet pdf image
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EPITAXIAL PLANAR NPN TRANSISTOR SILICON EPITAXIAL PLANAR TYPE DIODE
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Hitachi Semiconductor
2SA1025 Datasheet pdf image
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Silicon PNP Epitaxial
2SA1122 Datasheet pdf image
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Silicon PNP Epitaxial
2SA1350 Datasheet pdf image
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Silicon PNP Epitaxial
2SA1617 Datasheet pdf image
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Silicon PNP Epitaxial
2SB1026 Datasheet pdf image
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Silicon PNP Epitaxial
2SB1407 Datasheet pdf image
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Silicon PNP Epitaxial
2SB738 Datasheet pdf image
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Silicon PNP Epitaxial
2SB791 Datasheet pdf image
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Silicon PNP Epitaxial
2SD1366 Datasheet pdf image
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Silicon NPN Epitaxial

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What is Epitaxial


In electronic components, 'Epitaxial' is a term used in semiconductor manufacturing technology, and refers to a technology that forms a semiconductor layer with a critical growth process. This technology is used to improve the performance of semiconductor devices, especially in silicon-based semiconductor manufacturing.

Epitaxial deposition is the process of depositing one or more additional layers on top of an existing semiconductor prototype. This process is also called epitaxy and is usually done using methods such as Chemical Vapor Deposition (CVD) or Physical Vapor Deposition (PVD).

Epitaxial deposition is used for a variety of purposes:

Improved performance: Improves electron mobility and speed by forming a higher quality crystalline structure than the base material of semiconductor devices.

Doping: In the epitaxial process, specific atoms or ions can be doped to give desired electrical properties.

Improved Stability: The epitaxial layer has the same lattice structure as the underlying prototype, making it more stable than layers formed by other techniques.

Device Integration: Epitaxial processes are used to integrate multiple devices into a single semiconductor chip by depositing multiple layers.

Epitaxial deposition is considered a key technology in semiconductor manufacturing and plays a key role in improving the performance and efficiency of semiconductor devices. This technology forms the basis for the development of a wide range of products in the semiconductor industry, including high-performance microprocessors, memory chips, and LEDs.

*This information is for general informational purposes only, we will not be liable for any loss or damage caused by the above information.


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