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DIFFUSION Datasheet, PDF

Searched Keyword : 'DIFFUSION' - Total: 418 (1/21) Pages
ManufacturerPart #DatasheetDescription
Company Logo Img
KODENSHI_AUK CORP.
SO3517 Datasheet pdf image
259Kb/3P
Orange colored diffusion lens
Company Logo Img
Nihon Inter Electronics...
FSU08C60 Datasheet pdf image
221Kb/5P
Diffusion type silicon diode
KSF30A20E Datasheet pdf image
44Kb/4P
DIFFUSION-TYPE SILICON DIODE
TCU10A30 Datasheet pdf image
101Kb/4P
Diffusion type Silicon diode
Company Logo Img
KODENSHI_AUK CORP.
SYB5670 Datasheet pdf image
301Kb/3P
Milky Diffusion lens type
Company Logo Img
Panasonic Semiconductor
2SD2215 Datasheet pdf image
49Kb/2P
Silicon NPN triple diffusion planar type(Silicon NPN triple diffusion planar type)
Company Logo Img
Nihon Inter Electronics...
20KDA20 Datasheet pdf image
87Kb/5P
Diffusion-type Sillicon Rectifier Diode
Company Logo Img
KODENSHI_AUK CORP.
SA5711 Datasheet pdf image
273Kb/3P
Red colored diffusion lens type
Company Logo Img
Panasonic Semiconductor
2SC3869 Datasheet pdf image
51Kb/3P
Silicon NPN triple diffusion type
Company Logo Img
Hi-Sincerity Mocroelect...
HBF4522D Datasheet pdf image
32Kb/3P
NPN TRIPLE DIFFUSION PLANAR TRANSISTOR
Company Logo Img
Panasonic Semiconductor
2SC5909 Datasheet pdf image
78Kb/3P
Silicon NPN triple diffusion mesa type
22SC5405 Datasheet pdf image
37Kb/2P
Silicon NPN triple diffusion planar type
2SC3496 Datasheet pdf image
98Kb/4P
Silicon NPN triple diffusion planar type
2SC5884 Datasheet pdf image
75Kb/3P
Silicon NPN triple diffusion mesa type
2SC3870 Datasheet pdf image
59Kb/3P
Silicon NPN triple diffusion planar type
2SC5121 Datasheet pdf image
38Kb/2P
Silicon NPN triple diffusion planar type
2SD1350 Datasheet pdf image
39Kb/2P
Silicon NPN triple diffusion planer type
2SD1742 Datasheet pdf image
49Kb/2P
Silicon NPN triple diffusion planar type
Company Logo Img
Asahi Kasei Microsystem...
AK8125AE Datasheet pdf image
363Kb/10P
EMI Countermeasure Spectrum Scan Diffusion IC
Company Logo Img
Nell Semiconductor Co.,...
2SC5027 Datasheet pdf image
258Kb/5P
Silicon NPN triple diffusion planar transistor

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What is DIFFUSION


In electronic components, 'diffusion' is one of the semiconductor manufacturing processes, which means the process of injecting ions or atoms into semiconductor materials to form desired materials. Diffusion is used to control the distribution of doping materials within semiconductor devices or to form semiconductor regions with desired characteristics.

Diffusion consists of the following steps:

Purification: Refining semiconductor raw materials and preparing components in a clean state. This process ensures an accurate diffusion process by removing impurities and keeping the semiconductor substrate clean.

Masking: During the diffusion process, a masking material is used to protect the substrate to define the desired semiconductor region. Masking restricts the area so that diffusion only occurs where desired.

Diffusion: Inject the desired material into the substrate using diffusion equipment. Ions or atoms penetrate the surface of the semiconductor substrate and diffuse into the substrate to control the concentration of the substance. Diffusion time and temperature are important parameters that determine the diffusion rate and concentration of a substance.

Reverse Diffusion and Purification: Once diffusion is complete, unwanted material is removed using reverse diffusion or diffusion equipment. This step is performed to purify the semiconductor substrate.

Diffusion is one of the important steps in the semiconductor manufacturing process, and it affects the electrical characteristics and operation of semiconductor devices. In particular, diffusion is used for important tasks such as controlling the doping level of semiconductor devices, forming pn junctions, and creating multilayer structures.

*This information is for general informational purposes only, we will not be liable for any loss or damage caused by the above information.


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