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DIFFUSION Datasheet, PDF

Searched Keyword : 'DIFFUSION' - Total: 418 (9/21) Pages
ManufacturerPart #DatasheetDescription
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Panasonic Semiconductor
2SD1892 Datasheet pdf image
55Kb/3P
Silicon NPN triple diffusion planar type Darlington(For power amplification)
2SD1894 Datasheet pdf image
54Kb/3P
Silicon NPN triple diffusion planar type Darlington(For power amplification)
2SD2052 Datasheet pdf image
52Kb/3P
Silicon NPN triple diffusion planar type(For high power amplification)
2SD2254 Datasheet pdf image
57Kb/3P
Silicon NPN triple diffusion planar type Darlington(For power amplification)
2SD2276 Datasheet pdf image
57Kb/3P
Silicon NPN triple diffusion planar type Darlington(For power amplification)
Company Logo Img
Sharp Corporation
GL8PR26 Datasheet pdf image
79Kb/4P
2.0X5.0mm, Rectangle Type(Flangeless), Colored Diffusion LED Lamps for Indicator
GL9ED2 Datasheet pdf image
223Kb/4P
2.0X5.0mm, Rectangle Type, Milky Diffusion, Dichromatic LED Lamps for Indicator
Company Logo Img
List of Unclassifed Man...
GL8KG26 Datasheet pdf image
80Kb/4P
2.055.0mm, Rectangle Type(Flangeless), Colored Diffusion LED Lamps for Indicator
Company Logo Img
Panasonic Semiconductor
2SD2255 Datasheet pdf image
55Kb/3P
Silicon NPN triple diffusion planar type Darlington For power amplification
2SC5244 Datasheet pdf image
46Kb/2P
Silicon NPN triple diffusion mesa type(For horizontal deflection output)
2SC5478 Datasheet pdf image
35Kb/2P
Silicon NPN triple diffusion mesa type(For horizontal deflection output)
2SC5552 Datasheet pdf image
46Kb/1P
Silicon NPN triple diffusion mesa type(For horizontal deflection output)
2SC5583 Datasheet pdf image
46Kb/1P
Silicon NPN triple diffusion mesa type(For horizontal deflection output)
2SC5591 Datasheet pdf image
49Kb/1P
Silicon NPN triple diffusion mesa type(For horizontal deflection output)
2SD1275 Datasheet pdf image
62Kb/2P
Silicon NPN triple diffusion planar type Darlington(For power amplification)
2SD1276 Datasheet pdf image
62Kb/2P
Silicon NPN triple diffusion planar type Darlington(For power amplification)
2SD2138 Datasheet pdf image
61Kb/2P
Silicon NPN triple diffusion planar type Darlington(For power amplification)
2SD2250 Datasheet pdf image
57Kb/3P
Silicon NPN triple diffusion planar type Darlington(For power amplification)
2SD2273 Datasheet pdf image
56Kb/3P
Silicon NPN triple diffusion planar type Darlington(For power amplification)
2SD2530 Datasheet pdf image
45Kb/1P
Silicon NPN triple diffusion planer type Darlington(For power amplification)

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What is DIFFUSION


In electronic components, 'diffusion' is one of the semiconductor manufacturing processes, which means the process of injecting ions or atoms into semiconductor materials to form desired materials. Diffusion is used to control the distribution of doping materials within semiconductor devices or to form semiconductor regions with desired characteristics.

Diffusion consists of the following steps:

Purification: Refining semiconductor raw materials and preparing components in a clean state. This process ensures an accurate diffusion process by removing impurities and keeping the semiconductor substrate clean.

Masking: During the diffusion process, a masking material is used to protect the substrate to define the desired semiconductor region. Masking restricts the area so that diffusion only occurs where desired.

Diffusion: Inject the desired material into the substrate using diffusion equipment. Ions or atoms penetrate the surface of the semiconductor substrate and diffuse into the substrate to control the concentration of the substance. Diffusion time and temperature are important parameters that determine the diffusion rate and concentration of a substance.

Reverse Diffusion and Purification: Once diffusion is complete, unwanted material is removed using reverse diffusion or diffusion equipment. This step is performed to purify the semiconductor substrate.

Diffusion is one of the important steps in the semiconductor manufacturing process, and it affects the electrical characteristics and operation of semiconductor devices. In particular, diffusion is used for important tasks such as controlling the doping level of semiconductor devices, forming pn junctions, and creating multilayer structures.

*This information is for general informational purposes only, we will not be liable for any loss or damage caused by the above information.


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