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TRENCH Datasheet, PDF

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Searched Keyword : 'TRENCH' - Total: 8 (1/1) Pages
ManufacturerPart #DatasheetDescription
Company Logo Img
SHENZHEN FUMAN ELECTRON... 		3090K Datasheet pdf image
567Kb/5P		 N-Channel Trench Power MOSFET
30H10K Datasheet pdf image
687Kb/6P		 N-Channel Trench Power MOSFET
6080A Datasheet pdf image
645Kb/7P		 N-Channel Trench Power MOSFET
7580D Datasheet pdf image
755Kb/6P		 N-Channel Trench Power MOSFET
6080K Datasheet pdf image
650Kb/7P		 N-Channel Trench Power MOSFET
3060K Datasheet pdf image
654Kb/6P		 N-Channel Trench Power MOSFET
TC4606 Datasheet pdf image
730Kb/9P		 Dual Enhanced MOSFET (N-P Trench)
TC4606B Datasheet pdf image
594Kb/9P		 Dual Enhanced MOSFET (N-P Trench)

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What is TRENCH

Trench is one of the electronic component manufacturing technologies, and is used in the process of making semiconductor devices.

Trench technology is a technology developed to improve the electrical performance of semiconductor devices.

Trench technology redesigns the structure of semiconductor devices to improve device heat generation and performance degradation.

With trench technology, a small pit (trench) can be dug inside a semiconductor device to increase the surface area of the device.

This improves electrical performance because the path through which the current flows is shorter.

Trench technology is primarily used in high-performance semiconductor devices such as MOSFETs (Metal Oxide Semiconductor Field Effect Transistors).

These semiconductor devices are used in high-speed electronic circuits, power conversion devices, and automotive control devices.

Trench technology plays a very important role in the modern electronic component industry as it improves device performance and efficiency.

*This information is for general informational purposes only, we will not be liable for any loss or damage caused by the above information.


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