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TRENCH Datasheet, PDF

Searched Keyword : 'TRENCH' - Total: 84 (5/5) Pages
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Shenzhen Huazhimei Semi...
HMG40N65T Datasheet pdf image
753Kb/4P
650V 40A trench gate field cut-off type IGBT
HM603BK Datasheet pdf image
938Kb/8P
N & P-Channel enhancement mode power field effect transistor using high cell density DMOS trench technology.
HM609BK Datasheet pdf image
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N & P-Channel enhancement mode power field effect transistor using high cell density DMOS trench technology.
HM1P10MR Datasheet pdf image
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P-Channel logic enhancement mode power field effect transistor which is produced using high cell density, DMOS trench technology.

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What is TRENCH


Trench is one of the electronic component manufacturing technologies, and is used in the process of making semiconductor devices.

Trench technology is a technology developed to improve the electrical performance of semiconductor devices.

Trench technology redesigns the structure of semiconductor devices to improve device heat generation and performance degradation.

With trench technology, a small pit (trench) can be dug inside a semiconductor device to increase the surface area of the device.

This improves electrical performance because the path through which the current flows is shorter.

Trench technology is primarily used in high-performance semiconductor devices such as MOSFETs (Metal Oxide Semiconductor Field Effect Transistors).

These semiconductor devices are used in high-speed electronic circuits, power conversion devices, and automotive control devices.

Trench technology plays a very important role in the modern electronic component industry as it improves device performance and efficiency.

*This information is for general informational purposes only, we will not be liable for any loss or damage caused by the above information.


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